Book Title: Advanced Nanoscale ULSI Interconnects
By: Yosi Shacham-Diamand, Tetsuya Osaka, Madhav Datta,Takayuki Ohba
This is a field which influences our day to day life and still presents major technological and scientific challenges. This book reviews ULSI technology in light of all the novel electrochemical processes which make ULSI technology possible. The book will focus on sub-100 nm CMOS technology, mainly on copper-based metallization.
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